作者
Sergii Golovynskyi, Feihong Zhang, Jiangcheng Luo, Oleksandr I Datsenko, Vladyslav M Kravchenko, Weixiang Sang, Mingwei Jiang, Zhenhua Sun, Baikui Li, Lei Jin, Dengfeng Peng, Honglei Wu
期刊
Journal of Alloys and Compounds
简介
Photoluminescence (PL) of a Sm
3+-doped (~0.2 at%) AlN thin film is studied and compared to an undoped film. Being deposited by radio frequency magnetron sputtering, the films demonstrate a high-quality surface morphology, good crystallinity and even elemental distribution, although they appear to be oxygen-rich (AlN
0.9O
0.1). The Sm
3+-doped film emits a bright orange-red light at UV excitation. In the PL spectrum, a set of line bunches characteristic of Sm
3+ is found: the most intense ones at 580, 621 and 660 nm are identified to be due to radiative transitions from the excited Sm
3+ level
4G
5/2 to the ground ones
6H
5/2,
6H
7/2 and
6H
9/2, respectively. The PL excitation spectrum, being a broad band below 270 nm with shoulders at ~280–330 and 330–390 nm, demonstrates no characteristic lines of resonant Sm
3+ pumping. So, the rare-earth PL is sensitized by AlN-O defects and oxygen centers or Sm
3+-O
2 …